CMP Slurry: Chemical Mechanical Polishing

Product Description

The Col-K Polishing Suspension (CMP Slurry) is a high-quality solution designed for use in chemical mechanical polishing machines. The colloidal silica suspension provides a mirror-like finish and is one of the most effective solutions for producing a smooth and polished surface. However, the crystals in the solution can cause corrosion and attack the material, which is one of the disadvantages of this product.

In addition to its standard suspension, Col-K also offers specialised solutions for polishing difficult materials such as Stellite and Cobalt Chrome. The polishing slurry has both abrasive and chemical properties, making it ideal for use on these challenging materials. When used with Kemet CHEM Cloth, the liquid polish produces exceptional results on CMP polishing machines.

For the ultimate in convenience, Col-K(X) has been developed specifically for mirror polishing titanium without the need for any chemical additives. This specialised solution offers a simple and effective way to achieve a high-quality finish on titanium surfaces.